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O: Fachverband Oberflächenphysik
O 26: Poster: New Methods
O 26.7: Poster
Montag, 27. März 2023, 18:00–20:00, P2/EG
Optical Near-field Electron Microscopy — •Ilia Zykov1, Hanieh Jafarian1, Barbara Platzer1, Thomas Juffmann1, Amin Moradi2, Guido Stam2, Sense Jan van der Molen2, Ruud Tromp2, Nestor Fabian Lopez Mora3, Mariana Manuela Amaro3, Martin Kalbac3, Martin Hof3, and Radek Šachl3 — 1University of Vienna, Austria — 2Leiden University, the Netherlands — 3J. Heyrovsky Institute of Physical Chemistry, the Czech Republic
Lable- and damage-free imaging of the surface processes on the nanometer scales and over extended periods is required in different fields. Various electron microscopy techniques are applied to meet these requirements. However, the use of electrons in probing the sample may affect some specimens. The novel Optical Near-field Electron Microscopy (ONEM) technique [1] is being developed to overcome this drawback. In the ONEM light nondestructively interacts with a sample. The scattered light from the sample is then transformed into electrons by a nm-thick photocathode layer placed in the near-field region of the sample. The nm resolution images are then achieved through an electron readout using the Low Energy Electron Microscope.
The potential application of ONEM in biochemistry can be to follow the protein dynamics in lipid membranes at single protein resolution. In electrochemistry ONEM will be applied to study the nucleation and growth of nanoscale copper clusters without any electron beam effect.
[1] R. Marchand et al, Phys. Rev. Applied 16, 014008 (2021)