SKM 2023 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 43: Poster: Plasmonics and Nanooptics I

O 43.5: Poster

Dienstag, 28. März 2023, 18:00–20:00, P2/EG

Greyscale lithography with photoresist for plasmonic coupling — •Julian Alin, Michael Seidel, Thorsten Schumacher, and Markus Lippitz — Experimental Physics III, University of Bayreuth, Germany

Integrated plasmonic nanocircuits promise to play a major role for future applications of quantum optical technologies. Therefore stable, bright and narrow-band single-photon sources are required, such as self assembled epitaxially grown GaAs quantum dots [1]. Crucial for the coupling of such a quantum dot to a waveguide is, that for a high efficiency the waveguide has to be placed close to the quantum dot. However, the spatial proximity to the surrounding semiconductor material with a high refractive index strongly attenuates the surface plasmon propagation. In order to solve this problem we try to create a structure where the waveguide will be close to the quantum dot, but far away from the semiconductor material (a few hundred nanometers). To achieve this trough-like structure the idea is to apply a photoresist on a GaAs-sample, write a trough with a focussed gaussian laser beam and place a waveguide at this position. We discuss experiments on such structures with waveguides on glass substrates and first steps on GaAs wafers.

1 Wu et al., Nano Lett. 2017, 17, 7, 4291-4296