SKM 2023 –
wissenschaftliches Programm
O 57: Focus Session: Semiconductor Surface Chemistry – from Reaction Mechanisms to Well-Ordered Interfaces II
Mittwoch, 29. März 2023, 15:00–17:00, GER 38
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15:00 |
O 57.1 |
Topical Talk:
Incorporation of arsenic into silicon (001) and germanium (001) for atomic-scale device fabrication. — •Steven R. Schofield
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15:30 |
O 57.2 |
Controlling tip-induced reaction products of surface-adsorbed organic species on Si(001) — •Alexa Adamkiewicz, Tamam Bohamud, Marcel Reutzel, Gerson Mette, Ulrich Höfer, and Michael Dürr
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15:45 |
O 57.3 |
Topical Talk:
Semiconductor surface chemistry towards hybrid interfaces with ab initio approaches — •Ralf Tonner-Zech
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16:15 |
O 57.4 |
Oxygen vacancy occupancy influences oxygen evolution on BiVO4 — •Nicklas Österbacka, Hassan Ouhbi, and Julia Wiktor
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16:30 |
O 57.5 |
Adsorption and photocatalytic inactivation of SARS-CoV-2 and virus like particles on the surface of anatase TiO2(101) — •Mona Kohantorabi, Michael Wagstaffe, Marcus Creutzburg, Esko Erick Beck, Johannes Roessler, Reinhard Zeidler, Alexander Herrmann, Martin Feuerherd, Gregor Ebert, Gabriela Guédez, Christian Löw, Roland Thuenauer, Thomas F. Keller, Benedikt Sochor, Matthias Schwartzkopf, Andrei Chumakov, Stephan V. Roth, Ulrike Protzer, Wolfgang Hammerschmidt, Andreas Stierle, and Heshmat Noei
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16:45 |
O 57.6 |
Ab initio description of surface restructuring and phase boundaries under realistic conditions — •Yuanyuan Zhou, Chunye Zhu, Matthias Scheffler, and Luca M Ghiringhelli
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