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TT: Fachverband Tiefe Temperaturen
TT 58: Poster: Superconductivity II
TT 58.7: Poster
Thursday, March 30, 2023, 15:00–18:00, P2/OG3
Large-scale fabrication of Josephson parametric devices — •Maria-Teresa Handschuh1,2, Kedar E. Honasoge1,2, Yuki Nojiri1,2, Niklas Bruckmoser1,2, Leon Koch1,2, Daniil Bazulin1,2, Florian Fesquet1,2, Fabian Kronowetter1,2,4, Michael Renger1,2, Wun K. Yam1,2, Achim Marx1, Rudolf Gross1,2,3, and Kirill G. Fedorov1,2 — 1Walther-Meißner-Institut, 85748 Garching, Germany — 2Technical University of Munich, TUM School of Natural Sciences, Physics Department, 85748 Garching, Germany — 3Munich Center for Quantum Science and Technology, 80799 Munich, Germany — 4Rohde & Schwarz GmbH & Co. KG, 81671 Munich, Germany
The rapid progress in the field of quantum information processing with superconducting circuits requires the development of large-scale fabrication to increase fabrication efficiency, reproducibility as well as to reduce costs. Moreover, many advanced quantum applications and experiments rely on using multiple nominally identical chips, such as flux-driven Josephson parametric amplifiers (JPAs) [1]. To this end, the goal is to establish good control over various fabrication parameters, such as critical current density and microwave losses, in JPAs with Nb/Al-AlOx/Nb Josephson junctions on 4-inch high-resistivity silicon wafers. We provide a detailed analysis of the related parameter distribution across the wafer and make proposals for future improvements.
[1] K. G. Fedorov et al., Sci. Adv. 7, eabk0891 (2021)