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P: Fachverband Plasmaphysik

P 1: Low Pressure Plasmas and their Application I

P 1.5: Vortrag

Montag, 20. März 2023, 12:15–12:30, CHE/0089

Modeling electromagnetic phenomena in CCP VHF plasmas with an electromagnetic PIC-MCC code — •Denis Eremin¹, Thomas Mussenbrock², and Ralf Peter Brinkmann¹ — ¹Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Bochum, Germany — ²Institute of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

Increasing the electrode radius and the driving frequency would be beneficial for industrial applications of the capacitively coupled plasma reactors operated at low pressures. Unfortunately, this leads to the emergence of various nonuniformities having detrimental effects on the processing quality. The underlying physics is related to the excitation of two types of surface modes interacting with electrons and energizing them through different mechanisms. The present work investigates this problem numerically with a novel implicit energy- and charge-conserving electromagnetic PIC code ECCOPIC2M. It is demonstrated that due to the observed complexity of the processes taking place in such devices, the particle-in-cell method seems to be the only means potentially suitable for predictive studies of the plasma uniformity in CCPs in the considered parameter range.