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P: Fachverband Plasmaphysik
P 15: Laser Plasmas II/Low Pressure Plasmas and their Applications II
P 15.3: Vortrag
Donnerstag, 23. März 2023, 14:45–15:00, CHE/0089
Characterization of the ion angle distribution function in low-pressure plasmas using a microelectromechanical system — •Marcel Melzer1, Katja Meinel1, Chris Stoeckel1,2, Torben Hemke3, Thomas Mussenbrock3, and Sven Zimmermann1,2 — 1Center for Microtechnologies, Chemnitz University of Technology, Chemnitz, Germany — 2Fraunhofer Institute for Electronic Nano Systems ENAS, Chemnitz, Germany — 3Chair Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Informationtechnology, Ruhr-University Bochum, Germany
It has been demonstrated for the first time that a microelectromechanical system (MEMS) can be used to characterize the ion angle distribution function (IADF) of a low-pressure plasma. The MEMS is piezoelectrically actuated. The piezoelectric AlN is used both to tilt a 30 µm thick silicon plate as well as to monitor the tilt angle. Holes with a diameter of 2 µm were etched into the tilting plate. These high aspect ratio holes allow selection of ion incidence angles depending on the tilt angle of the MEMS. Below the MEMS, the ions are detected by a metal electrode. A numerical method is presented to determine the ion angle distribution function based on the measured data for the resonant operation of the MEMS.