SMuK 2023 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 5: Atmospheric Pressure Plasmas and their Applications I

P 5.2: Vortrag

Dienstag, 21. März 2023, 11:30–11:45, CHE/0089

Modelling and experimental analysis of DBDs in Ar-TMS and Ar-HMDS mixtures — •Marjan Stankov¹, Markus M. Becker¹, Lars Bröcker², Claus-Peter Klages², and Detlef Loffhagen¹ — ¹Leibniz Institute for Plasma Science and Technology (INP), 17489 Greifswald — ²Institute for Surface Technology (IOT), Technische Universität Braunschweig, 38108 Braunschweig

During the last two decades, plasma-enhanced chemical vapour deposition processes using atmospheric-pressure dielectric barrier discharges (DBDs) have become of great interest for fabricating various thin films and coatings. Here, fluid modelling and experimental analyses of such DBDs in argon with the addition of small amounts of tetramethylsilane (TMS) or hexamethyldisilane (HMDS) as precursors are reported. A plane-parallel and a single-filament discharge configuration are operated by sinusoidal voltages of few kV at frequencies of 86 and 19 kHz, respectively. A time-dependent, spatially one-dimensional fluid-Poisson model including an extensive reaction kinetic scheme for argon and the organosilicon presursors with about 90 species and 700 reactions is used for the modelling studies. Results for electrical discharge properties and relevant species in the DBD are represented and discussed. Penning ionization (PI) processes of excited argon species with the precursor gas are found to have a decisive impact on the discharge characteristics. In particular, it is found that cations generated due to PI processes are the dominant species for thin film formation.

Funded by the Deutsche Forschungsgemeinschaft (DFG) - project number 504701852.