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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 47: Wetting, Droplets, and Microfluidics (joint session DY/CPP)
CPP 47.4: Vortrag
Donnerstag, 21. März 2024, 15:45–16:00, BH-N 334
Numerical study of evaporation-driven particle deposition on a substrate — •Qingguang Xie1 and Jens Harting1,2 — 1Helmholtz-Institut Erlangen-Nürnberg for Renewable Energy (IEK-11), Forschungszentrum Jülich GmbH, Erlangen, Germany — 2Friedrich-Alexander-Universität Erlangen-Nürnberg, Nürnberg, Germany
Deposition of functional materials on a substrate is a vital process in printing and coating technologies, playing important roles in numerous applications such as photovoltaics, lithium batteries, and electrolysers. The structure of the deposition is crucial for device performance; however, our understanding of the deposition process is still lacking. We conducted numerical studies on the particle deposition process. Initially, we developed a diffusion-dominated evaporation model using a multicomponent lattice Boltzmann method. We validated the applicability of our model by demonstrating agreement in the time evolution of the interface position of an evaporating planar film and a freely floating droplet with analytical predictions. Subsequently, we investigated the deposition of particles on a substrate by drying a colloidal suspension droplet. We explored, both numerically and theoretically, the effect of friction between the particles and the substrate on the deposition pattern. With an increase in friction force, we observed a transition from a dot-like to a ring-like deposit. More recently, we studied the effect of van der Waals force between particles and substrate wettability on the deposition pattern when drying a thin film. We proposed a strategy to achieve highly uniform deposition.
Keywords: particle deposition; evaporation; droplet; thin film; lattice Boltzmann method