Berlin 2024 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 53: Responsive and Adaptive Systems II
CPP 53.3: Vortrag
Freitag, 22. März 2024, 12:15–12:30, H 0107
Local direction of opto-mechanical stress in azobenzene containing polymers during surface relief grating formation — •Sarah Loebner1, Bharti Yadav2, Nino Lomadze1, Nina Tverdokhleb2, Hendrik Donner3, Marina Saphiannikova2, and Svetlana Santer1 — 1Universität Potsdam, Potsdam, Germany — 2Leibniz Institute of Polymer Research Dresden, Dresden, Germany — 3CADFEM GmbH, Chemnitz, Germany
Here we unravel how the photo-induced deformation of azobenzene containing polymers relates to the local direction of opto-mechanical stresses generated during irradiation with interference patterns (IPs). We can substantiate the modeling approach in [1], that these deformations arise from the re-orientation of rigid backbone segments along the light polarization direction. In experiments we inscribe surface relief grating in pre-elongated photosensitive colloids of few micrometers using different IPs. The deformation of the colloidal particles is studied in-situ, whereby the local variation of the polymer topography is assigned to the local distribution of electrical field vector for all IPs. Orientation approach correctly predicts local variations of the main axis of light-induced stress in each interference pattern for both initially isotropic and highly oriented materials. With this work, we suggest that the orientation approach implements a self-sufficient and convincing mechanism to describe photo-induced deformation in azobenzene containing polymer films that does not require auxiliary assumptions.
[1] Yadav, B. et al., J. Phys. Chem. B 2019, 123, 3337-3347.
Keywords: azobenzene containing polymers; colloidal particles; direction of opto-mechanical stress; orientation approach