Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

CPP: Fachverband Chemische Physik und Polymerphysik

CPP 53: Responsive and Adaptive Systems II

CPP 53.3: Vortrag

Freitag, 22. März 2024, 12:15–12:30, H 0107

Local direction of opto-mechanical stress in azobenzene containing polymers during surface relief grating formation — •Sarah Loebner¹, Bharti Yadav², Nino Lomadze¹, Nina Tverdokhleb², Hendrik Donner³, Marina Saphiannikova², and Svetlana Santer¹ — ¹Universität Potsdam, Potsdam, Germany — ²Leibniz Institute of Polymer Research Dresden, Dresden, Germany — ³CADFEM GmbH, Chemnitz, Germany

Here we unravel how the photo-induced deformation of azobenzene containing polymers relates to the local direction of opto-mechanical stresses generated during irradiation with interference patterns (IPs). We can substantiate the modeling approach in [1], that these deformations arise from the re-orientation of rigid backbone segments along the light polarization direction. In experiments we inscribe surface relief grating in pre-elongated photosensitive colloids of few micrometers using different IPs. The deformation of the colloidal particles is studied in-situ, whereby the local variation of the polymer topography is assigned to the local distribution of electrical field vector for all IPs. Orientation approach correctly predicts local variations of the main axis of light-induced stress in each interference pattern for both initially isotropic and highly oriented materials. With this work, we suggest that the orientation approach implements a self-sufficient and convincing mechanism to describe photo-induced deformation in azobenzene containing polymer films that does not require auxiliary assumptions.

[1] Yadav, B. et al., J. Phys. Chem. B 2019, 123, 3337-3347.

Keywords: azobenzene containing polymers; colloidal particles; direction of opto-mechanical stress; orientation approach