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DS: Fachverband Dünne Schichten
DS 20: Poster II
DS 20.23: Poster
Thursday, March 21, 2024, 18:00–20:30, Poster D
Plasma enhanced pulsed laser deposition of metal nitride and oxide thin films Dual radio frequency plasma enhanced pulsed laser deposition of metal nitride and oxide thin films — Heman Bhuyan1, Rodrigo Villegas1, Valentina Ureta1, Miguel Escalona1, Maria Jose Retamal2, Maria Jose Inestroza3, José Ignacio Fernández1, Loïk Gence1, •Ulrich G. Volkmann1, and Yayoi Takamura4 — 1Instituto de Física, Pontificia Universidad Católica de Chile, Santiago, Chile — 2Facultad de Ingenieria, Universidad Finis Terrae, Santiago, Chile — 3Comisión Chilena de Energía Nuclear, Santiago, Chile — 4Department of Materials Science and Engineering, University of California Davis, CA, USA
In this work, physics and application of a plasma enhanced pulsed laser deposition (PEPLD) system using dual radio frequency (RF) source will be presented. The dual radio frequency (RF) source has an additional benefit of controlling the ion energy and ion flux independently only by tuning the low frequency (LF) and high frequency (HF) components, respectively. Electrical and optical diagnostics, including time-resolved images, optical emission spectroscopy, and interferometry have been used to study the physics behind this PEPLD configuration. The results obtained from the deposition of titanium nitride and titanium dioxide thin films will be correlated with the interaction between the laser plum and the background RF plasma at different experimental conditions. The PEPLD system has successfully used to fabricate wrinkled titanium nitride nanocomposite for robust bendable electrodes. Acknowledgements: ANID FONDECYT 1220359.
Keywords: PLD; PEPLD; TiN; TiO2