Berlin 2024 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 21: Optical Analysis of Thin Films

DS 21.9: Vortrag

Freitag, 22. März 2024, 12:00–12:15, A 053

Exploring the optical constants of ruthenium (Ru) through EUV metrology:a study on thin films — •Samira Naghdi and Victor Soltwisch — Abbestraße 2-12, 10587 Berlin, Germany

This study presents a comprehensive investigation into the optical constants of ruthenium (Ru), focusing on thin films with a thickness of 30 nm. Employing Extreme Ultraviolet (EUV) metrology, our study investigates the spectral response of Ru across a wavelength range of 10 to 20 nm. The experimental setup involved measurements at varying angles, ranging from 2 to 88 degrees, to provide a thorough understanding of the material's optical behavior. The utilization of EUV metrology in this research not only ensures precision in wavelength selection but also offers a unique insight into the optical properties of Ru within the EUV spectrum. The study aims to contribute valuable data to the broader understanding of Ru's behavior, particularly in thin film applications, with potential implications for advancements in nanotechnology, optoelectronics, and other fields where ruthenium plays a crucial role. The results of this study not only contribute to the fundamental understanding of ruthenium's optical properties but also open avenues for further exploration and application in cutting-edge technologies.

Keywords: EUV metrology; Ruthenium; Optical properties; Thin film; short wavelengths