Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DY: Fachverband Dynamik und Statistische Physik

DY 27: Focus Session: Nanomechanical Systems for Classical and Quantum Sensing II (joint session HL/DY/TT/QI)

DY 27.4: Vortrag

Mittwoch, 20. März 2024, 15:45–16:00, EW 202

Dry processing of high Q 3C-silicon carbide nanostring resonators — •Felix David, Philipp Bredol, and Eva Weig — Technical University of Munich - Chair of Nano and Quantum Sensors, Garching, Germany

We fabricate string resonators from strongly stressed 3C-silicon carbide (SiC) grown on a silicon substrate. The conventional fabrication process involves electron-beam lithography with PMMA to define a metallic hard mask for the subsequent dry-etching step via a liftoff process. This requires some wet-chemical process steps, which can destroy our samples. Here we describe an alternative process, which avoids all wet-chemical process steps to enable superior quality. It involves the use of a negative electron-beam resist as an etch mask, as well as the completely reactive-ion etching-based release of the nanostrings. The dry-processed nanostrings can be fabricated with a high yield and exhibit high mechanical quality factors at room temperature. Due to the high reliability combined with the high process speed, it also allows us to investigate material-intensive questions, such as the influence of etching depth and undercut on the mechanical quality factor.

Keywords: Silicon carbide; Nanomechanics; Semiconductor; Fabrication