Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

HL: Fachverband Halbleiterphysik

HL 13: Poster I

HL 13.31: Poster

Montag, 18. März 2024, 15:00–18:00, Poster E

Reduction of droplet density for pulsed Laser Deposition of functional oxides — •Jonas Elz, Arne Jörns, Holger von Wenckstern, and Marius Grundmann — Leipzig University, Felix Bloch Institute for Solid State Physics, Semiconductor Physics Group, Leipzig, Germany

Pulsed laser deposition is a highly flexible and reproducible technique for epitaxial growth of high quality thin films [1]. Two major problems occurring for certain target materials are the formation of droplets on the substrate and the increasing surface roughness of the target during laser ablation that may cause a change of the expansion direction of the plasma plume towards the direction of the incident laser beam [2, 3]. Thin films containing droplets are undesirable for device applications.

In this work, we present means for a significant reduction of the density of droplets for copper oxide targets using a shadow mask (so-called eclipse) between target and substrate. The effect of the laser fluence incident on target on its surface roughness and the change of plasma plume expansion direction during deposition will be presented in detail.

[1] David P. Norton, in Pulsed Laser Deposition of Thin Films, Wiley, Hoboken (2007)

[2] S. Fahler et al., Appl. Surf. Sci. 109/110 433-436 (1997)

[3] C. Doughty et al., Appl. Phys. Lett. 66, 1276-1278 (1995)

Keywords: pulsed Laser Deposition; droplets; thin film; copper oxide