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HL: Fachverband Halbleiterphysik
HL 14: Poster II
HL 14.5: Poster
Montag, 18. März 2024, 15:00–18:00, Poster F
Assessing the alignment accuracy of state-of-the-art deterministic fabrication methods for single quantum dot devices — Abdulmalik Madigawa1, •Jan Donges2, Benedek Gaal1, Shulun Li2,3,4, Hanqing Liu3,4, Deyan Dai3,4, Xiangbin Su3,4, Xiangjun Shang3,4, Haiqiao Ni3,4, Johannes Schall2, Sven Rodt2, Zhichuan Niu3,4, Niels Gregersen1, Stephan Reitzenstein2, and Battulga Munkhbat1 — 1TU Denmark — 2TU Berlin — 3Institute of Semiconductors Beijing — 4University of Chinese Academy of Sciences Beijing
The realization of efficient quantum light sources relies on the integration of self-assembled quantum dots (QDs) into photonic nanostructures with high spatial positioning accuracy. In this work, we present a comprehensive investigation of the QD position accuracy, obtained using two markerbased QD positioning techniques, photoluminescence (PL) and cathodoluminescence (CL) imaging, as well as using a marker-free in-situ electron beam lithography (in-situ EBL) technique. We employ four PL imaging configurations with three different image processing approaches and compare them with CL imaging. We fabricate circular mesa structures based on the obtained QD coordinates from both PL and CL image processing to evaluate the final positioning accuracy. We discuss the possible causes of the observed offsets, which are significantly larger than the QD localization uncertainty obtained from simply imaging the QD light emission from an unstructured wafer.
Keywords: Quantum dot; deterministic fabrication; single photon devices