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HL: Fachverband Halbleiterphysik

HL 21: Heterostructures, Interfaces and Surfaces I

HL 21.6: Vortrag

Dienstag, 19. März 2024, 11:00–11:15, EW 561

Implementation of polaritonic lattices using patterning and oversputtering techniques — •David Laibacher, Johannes Düreth, Simon Betzold, Siddhartha Dam, Monika Emmerling, Sven Höfling, and Sebastian Klembt — Julius-Maximilians-Universität Würzburg, Physikalisches Institut and Würzburg-Dresden Cluster of Excellence ct.qmat, Lehrstuhl für Technische Physik, Am Hubland, 97074 Würzburg, Deutschland

Exciton-Polaritons have been a focus of study during recent years due to their ability to form a driven-dissppative Bose-Einstein-Condensate in two dimensions at finite temperatures. One way to study them accesibly is using a laser to generate exitons in an active material located between two distributed Bragg reflectors (DBR), confining the photon in one direction. In this work, the polaritonic potential landscape is manipulated due to confinement of it’s photonic part by manipulating the length of the cavity layer in order to create different structures with components in the order of microns. The length of the cavity is manipulated by either etching a few tens of nanometers into (Etch and Oversputter) or depositing a similar thickness of TiO₂ discs onto (Deposition and Oversputter) the cavity layer. This enables the creation of polariton lattices with features in the order of nanometers, which was not possible using previously established techniques such as etching micropillars. The top DBR is deposited using sputtering, aiming to achieve a similar quality when compared to growing it using molecular beam epitaxy, thus allowing easier sample-generation and faster structural optimization.

Keywords: Polariton Laser; Etch and Oversputter; Deposition and Oversputter; Exciton-Polaritons; Semiconductor Microcavity