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HL: Fachverband Halbleiterphysik

HL 38: Oxide Semiconductors II

HL 38.2: Talk

Thursday, March 21, 2024, 09:45–10:00, ER 325

Simulation of multi-component target ablation: a novel combinatorial pulsed laser deposition technique — •Arne Jörns, Holger von Wenckstern, and Marius Grundmann — Leipzig University, Felix Bloch Institute for Solid State Physics

Combinatorial pulsed laser deposition (C-PLD) has become a well-established method in combinatorial material science. With radial and azimuthal target segmentation discrete material libraries with samples of homogeneous composition as well as samples with a continuous composition spread can be obtained from a single target. Thus, target and substrate consumption is significantly reduced. However, powder blending, insufficient hardening or thermic decomposition due to deviating sintering temperatures of the source powders for the respective target segments make the fabrication of such targets technically demanding.

In this work we present two novel deposition approaches for C-PLD which bypass the above mentioned challenges of target preparation. Both techniques allow discrete material libraries covering the entire binary phase diagram. Experimentally, n-type semiconducting zinc-tin-oxide thin films were fabricated with the novel C-PLD approaches, and elemental distributions are well described by simulations made beforehand. Electrical properties are compared to such of zinc-tin-oxide thin films prepared by conventional PLD.

Keywords: pulsed laser deposition; simulation; segmented target; zinc-tin-oxide; thin film

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