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HL: Fachverband Halbleiterphysik

HL 38: Oxide Semiconductors II

HL 38.6: Vortrag

Donnerstag, 21. März 2024, 11:00–11:15, ER 325

Analysis and prediction of thickness distributions for combinatorial pulsed laser deposition — •Clemens Petersen, Holger von Wenckstern, and Marius Grundmann — Universität Leipzig, Felix-Bloch-Institut, Leipzig, Deutschland

Recently combinatorial deposition methods have increasingly gained scientists’ attention, due to the high experimental throughput and resource-wise efficiency they offer in materials discovery. Our combinatorial pulsed laser deposition (c-PLD) method allows for the deposition of entire material libraries on e.g. a single substrate [1]. Accompanied by the usage of high-throughput measurements such as spectroscopic ellipsometry and X-ray diffraction, the characterization of the material systems’ physical properties with high chemical resolution and comparably low efforts becomes feasible [2]. By employing the plasma plume expansion model suggested by Anisimov et al. [3] and the resulting spatial material-deposition distribution we calculate binary growth rates as function of position on the substrate enabling us to predict film thickness and composition. As a case in point, the deposition of sesquioxide materials can be described exceptionally well over a large range of PLD parameters. Using these results we demonstrate that the binary distributions can be used to predict the thickness- and compositional distributions for ternary alloys grown with c-PLD with high precision. [1] H. von Wenckstern et al., pss(b), Vol. 257, 1900626 [2] A. Hassa et al., pss(b), Vol. 258, 2000394 [3] S. I. Anisimov et al., Phys. Rev. B, Vol 48, 12076.

Keywords: PLD; Growth; Thickness Distributions; digital Twin; thin films