Berlin 2024 – wissenschaftliches Programm
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KFM: Fachverband Kristalline Festkörper und deren Mikrostruktur
KFM 9: KFM Poster Session
KFM 9.16: Poster
Montag, 18. März 2024, 18:00–20:00, Poster E
An X-ray diffraction studie on AlCrVY(O)N thin films — •Eric Schneider1, Michael Paulus1, Finn Ontrup2, Nelson Filipe Lopes Dias2, and Wolfgang Tillmann2 — 1Fakultät Physik/DELTA TU Dortmund University, 44221 Dortmund, Germany — 2Institute of Materials Engineering, Dortmund, Germany
The aim of this project is to gain a fundamental understanding of the dependence between deposition parameters, layer structure and oxidation behavior of different AlCrN, AlCrVYN, AlCrVYON coatings. For this purpose, the coating systems were deposited on a WC-Co composite substrate by direct-current magnetron sputtering (dcMS), high power impulse magnetron sputtering (HiPIMS) and a hybrid dcMS/HiPIMS process. For the investigation of the samples we used synchrotron radiation at beamline BL9 of the synchrotron radiation source DELTA (Dortmund, Germany). The samples were heated in an heating cell to temperatures up to 1000∘C to study their oxidation behavior. Depending on the process parameters, different oxidation behaviour and residual stresses present in the samples were observed by X-ray diffraction. We thank DELTA for providing synchrotron radiation. This work was supported by the DFG via TO 169/21-1.
Keywords: Thinfilm; Oxide; X-ray; PVD; Diffraction