Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

MA: Fachverband Magnetismus

MA 46: Poster II

MA 46.27: Poster

Donnerstag, 21. März 2024, 15:00–18:00, Poster C

Surface roughness optimization of 2D and 3D 2-Photon Polymerization Lithography templates and their influence on magnetic thin film properties — •Christian Janzen, Bhavadip Bharatbhai Rakholiya, Florian Ott, Rico Huhnstock, and Arno Ehresmann — Institute of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Kassel, Germany

To experimentally investigate the impact of geometry and curvature on the properties of magnetic thin film systems, micron-sized slanted/curved structures were prepared by 2-photon polymerization (2PP) lithography. By systematically varying the 2PP process parameters, the root-mean-square roughness of 2D/3D shaped structures is minimized. Adding a Cu buffer layer, further smoothening of the surface was achieved, as atomic force microscopy measurements show. Elevating the structures with lithographically produced spacers allows us to investigate two scenarios for the deposition of a magnetic thin film on top of these structures: (1) the 2D/3D magnetic film is connected to surrounding flat film (no spacer) and (2) the 2D/3D magnetic film is isolated (with spacer). Therefore, it is possible to tune the exchange and dipolar interaction of 2D/3D microstructured magnetic thin films. The magnetic properties of a ferromagnetic thin film as a function of the surface roughness and shape anisotropy (i.e., the geometry of the templating structure) are investigated using magneto-optical Kerr microscopy.

Keywords: 3D Micromagnetism; Two-Photon Polymerization lithography; shape anisotropy; Kerr microscopy; surface roughness