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MM: Fachverband Metall- und Materialphysik

MM 47: Poster DS (joint session DS/MM/O)

MM 47.16: Poster

Mittwoch, 20. März 2024, 17:00–19:00, Poster B

Novel nanofabrication facility for ultra-clean samples — •Alexander Fuhrich and Martin Salinga — Institut für Materialphysik, Universität Münster, Wilhelm-Klemm-Str. 10, 48149 Münster

We present the capabilities of a novel nanofabrication facility dedicated to the fabrication of nanostructures under ultra-clean conditions. In addition to a UHV cluster for MBE growth, the system comprises a lithography unit in an inert argon atmosphere. Air- and water-sensitive samples, like materials for memristive switches, can be structured using thermal scanning probe lithography with a lateral resolution down to less than 30 nm. Samples can be analyzed in-situ using RT-STM and RHEED. A self-sufficient UHV suitcase is used to characterize samples in other setups, such as femtosecond-laser pump probe spectroscopy, without ever exposing our samples to air.

Keywords: Nanofabrication; ultra-clean samples; MBE; thermal scanning probe lithography