Berlin 2024 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 107: Nanostructured Surfaces and Thin Films
O 107.3: Vortrag
Freitag, 22. März 2024, 11:00–11:15, MA 042
Fabrication of Nanofluidic Channels by Pulsed Laser Irradiation of SiOx-coated Fused Silica — •Nastaran Bakhtiari1,2 and Jürgen Ihlemann1 — 1Institut für Nanophotonik Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077 Göttingen, Germany — 2Theoretical Physics and Center of Interdisciplinary Nanostructure Science and Technology, FB10, Universität Kassel, Heinrich-Plett-Str. 40, 34132 Kassel, Germany.
Considerably, nanofluidic channels have recently garnered attention. Existing methods for fabricating nanochannels are complex, costly, and time-intensive. In this study, we efficiently created transparent nanofluidic channels on fused silica substrates (SiO2) using a simple two-step process. Employing single-pulse excimer laser irradiation with a rear configuration treated a UV-absorbing silicon suboxide (SiOx) film through the transparent SiO2 substrate. A polydimethylsiloxane (PDMS) superstrate applied before laser exposure served as a confinement for controlled structure formation. Under optimal laser fluence, the thin SiOx film buckled, leading to the formation of channels with a width ranging from 10 to 20 µm and a height of 800 to 1200 nm, exhibiting a bell-like cross-sections following the so-called Euler buckling mode. Wider channels displayed varicose or telephone cord morphologies. Subsequent high-temperature annealing oxidized SiOx, resulting in transparent SiO2 channels. These nanochannels show promise in effectively transporting fluids of various viscosities, demonstrated through capillary action and in line with the Lucas-Washburn equation.
Keywords: Silicon suboxide; Fused silica; Excimer laser; Nanochannels; Nanofluidics