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O: Fachverband Oberflächenphysik

O 36: Poster: Ultrafast Electron Dynamics at Surfaces and Interfaces

O 36.18: Poster

Tuesday, March 19, 2024, 18:00–20:00, Poster C

A high repetition rate XUV source for time-resolved momentum space mapping of photoelectrons — •Yu Zhang, Adam S. Wyatt, James O. F. Thomson, Richard T. Chapman, Charlotte E. Sanders, and Emma Springate — Central Laser Facility, STFC Rutherford Appleton Laboratory, Research Complex at Harwell, Harwell, United Kingdom

With an ultrashort pulsed extreme ultraviolet (XUV) laser as the photon source, angle-resolved photoemission spectroscopy (ARPES) has extended the study of electronic structure beyond the 3D momentum space and into the temporal domain, with femtosecond resolution. Recently a new high repetition rate (100 kHz) XUV source has been developed in the Artemis facility of Central Laser Facility, UK, to provide an XUV beam source at energies from 20 to 45 eV, with a maximum flux of about 10¹⁰ photons/second. Together with a tunable laser source, time-resolved ARPES measurements are offered at Artemis with much higher data collection efficiency compared to the previous setup based on a 1 kHz system.

In this poster, the detailed beamline setup will be demonstrated. Besides a pulse-duration preserving XUV monochromator, a demagnification unit has been developed to focus the XUV spot size down to about 20 micrometers at the sample. This new capability allows users to perform experiments on small samples and distinct structural domains of inhomogeneous samples.

Keywords: Ultrafast electron dynamics; pump probe; ARPES; Time resolved; XUV