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O: Fachverband Oberflächenphysik
O 56: Metal Substrates II
O 56.4: Vortrag
Mittwoch, 20. März 2024, 15:45–16:00, MA 043
Epitaxial CoCrFeNi films for surface investigations — Holger Schwarz1, Jonathan Apell1,2, Robert Wonneberger1, Andreas Undisz1, Julian Ledieu3, Vincent Fournée3, Peter Richter1, and •Thomas Seyller1 — 1Chemnitz University of Technology, Chemnitz, Germany — 2Friedrich Schiller University Jena, Jena, Germany — 3Université de Lorraine, Nancy, France
High-entropy alloys (HEAs) are discussed for applications in the fields of corrosion, wear protection and electrocatalysis. Although the surface properties play a central role in these applications, they are still largely unexplored, which is caused by the unavailability of single-crystalline samples. In this presentation, recent progress is reported on the growth and subsequent characterization of epitaxial CoCrFeNi films [1], which were deposited by DC magnetron sputtering from spark-plasma sintered targets [2] on single-crystalline oxide substrates. A characterization of structural, chemical and electronic properties of the films was performed by different techniques including X-ray diffraction, scanning electron and transmission electron microscopy, energy-dispersive X-ray spectroscopy, photoelectron spectroscopy, low-energy electron diffraction and, more recently, by scanning tunneling microscopy. It is demonstrated that epitaxially grown HEA films have the potential to fill the sample gap, allowing for fundamental studies of properties of and processes on well-defined HEA surfaces over the full compositional space. [1] H. Schwarz, et al., Advanced Materials 35 (2023) 2301526. [2] H. Schwarz, et al., Coatings 11 (2021) 468.
Keywords: High-entropy alloy; Epitaxy; magnetron sputtering