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O: Fachverband Oberflächenphysik
O 66: Poster: Nanostructures at Surfaces
O 66.1: Poster
Mittwoch, 20. März 2024, 18:00–20:00, Poster C
Direct electron beam patterning of electro-optically active PEDOT:PSS for switchable metasurfaces — •Dominik Ludescher1, Siddharth Doshi2,3, Julian Karst1, Moritz Floess1, Johan Carlström3, Bohan Li3, Nofar Mintz Hemed2, Yi-Shiou Duh3, Nicholas A. Melosh2, Mario Hentschel1, Mark Brongersma3 und Harald Giessen1 — 14th Physics Institute and Research Center SCoPE, University of Stuttgart, Germany — 2Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305, United States — 3Geballe Laboratory for Advanced Materials, Stanford University, 476 Lomita Mall, Stanford, CA 94305, USA
Conducting polymers, exemplified by PEDOT:PSS, exhibit distinctive electronic and polymeric attributes. When subjected to CMOS-compatible voltages, PEDOT:PSS transitions between insulating and metallic states via an intrinsic electrochemical redox reaction. Consequently, these materials are suited perfectly for AR/VR applications, advanced display technologies, and dynamic sensors. Harnessing the full potential, however, demands a robust foundation in fabrication techniques. Historically, electron-beam lithography was utilized to generate a resistant etch mask, albeit with fabrication complexities. To circumvent some of these challenges, we present a novel and alternative fabrication method. This concept is based on the electron-beam induced water solubility modulation due to crosslinking between the PEDOT:PSS polymer chains. With this approach nano-wire structures with a width of down to 250 nm can be achieved.
Keywords: Electron-Beam Lithography; Nanostructuring Mechanism; Optoelectronic Devices; Switchable Metasurfaces; Conducting Polymer PEDOT:PSS