Berlin 2024 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 9: Semiconductor Substrates I: Adsorption of Small Molecules, Metallic Nanowires, Overlayers
O 9.2: Vortrag
Montag, 18. März 2024, 10:45–11:00, MA 144
N-Heterocyclic Olefins on a Silicon Surface — •Martin Franz1, Mowpriya Das2, Conor Hogan3,4, Robert Zielinski1, Milan Kubicki1, Maximilian Koy2, Canan Kosbab1, Simone Brozzesi4, Ankita Das2, Mike Thomas Nehring1, Viktoria Balfanz1, Juls Brühne1, Mario Dähne1, Norbert Esser1,5, and Frank Glorius2 — 1Technische Universität Berlin, Institut für Festkörperphysik, Berlin, Germany — 2Westfälische Wilhelms-Universität Münster, Organisch-Chemisches Institut, Münster, Germany — 3Istituto di Struttura della Materia-CNR (ISM-CNR), Rome, Italy — 4Università di Roma "Tor Vergata", Dipartimento di Fisica, Rome, Italy — 5Leibniz-Institut für Analytische Wissenschaften "ISAS e.V.", Berlin, Germany
N-Heterocyclic carbenes are known to be excellent ligands for surface modification, and recently also the formation of ordered monolayers on silicon has been reported [1]. In contrast, surface adsorption of their close relatives, the N-heterocyclic olefins (NHOs), has not been studied yet. Here, a combined scanning tunneling microscopy, X-ray photoelectron spectroscopy, and density functional theory study of NHOs on silicon is presented. We find that the two studied NHOs bind covalently with ylidic character to the silicon adatoms of the substrate and exhibit good thermal stability. The adsorption geometry is found to depend on the N-substituents and strongly influences the quality and properties of the obtained monolayers.
[1] M. Franz et al., Nat. Chem. 13, 828-835 (2021).
[2] M. Das et al., Angew. Chem. Int. Ed. 2023, e202314663.
Keywords: N-heterocyclic olefins; Scanning tunneling microscopy; Si(111); organic monolayers