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O: Fachverband Oberflächenphysik

O 9: Semiconductor Substrates I: Adsorption of Small Molecules, Metallic Nanowires, Overlayers

O 9.2: Vortrag

Montag, 18. März 2024, 10:45–11:00, MA 144

N-Heterocyclic Olefins on a Silicon Surface — •Martin Franz¹, Mowpriya Das², Conor Hogan^3,4, Robert Zielinski¹, Milan Kubicki¹, Maximilian Koy², Canan Kosbab¹, Simone Brozzesi⁴, Ankita Das², Mike Thomas Nehring¹, Viktoria Balfanz¹, Juls Brühne¹, Mario Dähne¹, Norbert Esser^1,5, and Frank Glorius² — ¹Technische Universität Berlin, Institut für Festkörperphysik, Berlin, Germany — ²Westfälische Wilhelms-Universität Münster, Organisch-Chemisches Institut, Münster, Germany — ³Istituto di Struttura della Materia-CNR (ISM-CNR), Rome, Italy — ⁴Università di Roma "Tor Vergata", Dipartimento di Fisica, Rome, Italy — ⁵Leibniz-Institut für Analytische Wissenschaften "ISAS e.V.", Berlin, Germany

N-Heterocyclic carbenes are known to be excellent ligands for surface modification, and recently also the formation of ordered monolayers on silicon has been reported [1]. In contrast, surface adsorption of their close relatives, the N-heterocyclic olefins (NHOs), has not been studied yet. Here, a combined scanning tunneling microscopy, X-ray photoelectron spectroscopy, and density functional theory study of NHOs on silicon is presented. We find that the two studied NHOs bind covalently with ylidic character to the silicon adatoms of the substrate and exhibit good thermal stability. The adsorption geometry is found to depend on the N-substituents and strongly influences the quality and properties of the obtained monolayers.

[1] M. Franz et al., Nat. Chem. 13, 828-835 (2021).

[2] M. Das et al., Angew. Chem. Int. Ed. 2023, e202314663.

Keywords: N-heterocyclic olefins; Scanning tunneling microscopy; Si(111); organic monolayers