Berlin 2024 – scientific programme

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TT: Fachverband Tiefe Temperaturen

TT 18: Superconductivity: Poster

TT 18.27: Poster

Monday, March 18, 2024, 15:00–18:00, Poster C

Fabrication Limits and Design Rules for Fabricating Optimized In-Situ Multi-Terminal Josephson Junctions — •Justus Teller^{1, 3, 4}, Christian Schäfer^{1, 3, 4}, Gerrit Behner^{1, 3, 4}, Abdur Rehman Jalil^{2, 3}, Benjamin Bennemann^{2, 3}, Peter Schüffelgen^{1, 3}, Detlev Grützmacher^{1, 3, 4}, and Thomas Schäpers^{1, 3, 4} — ¹Peter Grünberg Institute (PGI-9): Institute of Semiconductor Nanoelectronics, Forschungszentrum Jülich, Jülich, 52425, Germany — ²Peter Grünberg Institute (PGI-10): Institute of Energy-efficient Information Technology, Forschungszentrum Jülich, Jülich, 52425, Germany — ³Jülich Aachen Research Alliance, Jülich, 52425, Germany — ⁴RWTH Aachen University, Aachen, 52074, Germany

In connection with topological insulator, multi-terminal Josephson junctions offer a promising platform for topological quantum computation. In-situ stencil lithography is a well-established technique for fabricating molecular-beam-epitaxy-grown high-transparency Josephson junctions. However, there is still a lack of knowledge about design limits and the corresponding reliability of the used stencil masks. This work describes the fabrication of in-situ Josephson junctions in detail and shows data of more than a thousand stencil masks from two chips examined under scanning electron microscope. The stencil masks are optimized for two-, three-, and four-terminal Josephson junctions. Design rules for fabricating reliable stencil masks are explained. Deviations between design and realized structure are discussed. The mask reliability is computer simulated by using the finite element method.

Keywords: multi-terminal Josephson junctions