Berlin 2024 – wissenschaftliches Programm
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TT: Fachverband Tiefe Temperaturen
TT 46: Focus Session: Evolution of Topological Materials into Superconducting Nanodevices (joint session HL/TT)
TT 46.5: Vortrag
Mittwoch, 20. März 2024, 12:45–13:00, EW 202
Nanoscale patterning of topological insulator thin film using a helium ion microscope — •Holger Mirkes1,2, Filippo Romano1,2, and Christoph Kastl1,2 — 1Walter Schottky Institute and Physik-Department, Technical University of Munich, Germany. — 2Munich Center for Quantum Science and Technology (MCQST), Munich, Germany.
The helium ion microscope has evolved as a versatile tool for not only nanoscale imaging, but also nanoscale fabrication with a resolution well below 10 nm, limited only by substrate proximity effects for atomically thin films [1]. Here, we discuss the application of He-ion beam milling for nanofabrication of lateral superlattice structures in topological insulator thin films. We present results both on supported films grown by molecular beam epitaxy as well as on suspended films prepared by scotch tape exfoliation. The superior resolution of the He-ion microscope may be used to create lateral superlattice structures with topologically protected satellite Dirac cones [2]. The research is supported through the European Union*s Horizon Europe Research and Innovation Programme under Grant Agreement No 101076915 (2DTopS).
[1] E. Mitterreiter et al., Nano Lett. 2020, 20, 4437*4444.
[2] J. Cano et al., Phys. Rev. B 2021, 103, 155157.
Keywords: Topological Insulator; Superlattice; Helium Ion Microscope