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A: Fachverband Atomphysik
A 38: Trapped Ions (joint session Q/A)
A 38.3: Vortrag
Freitag, 15. März 2024, 11:45–12:00, HS 1199
Fabrication of multisegmented ion traps in a specialized cleanroom — •Alexander Müller1, Jan Müller1, Björn Lekitsch1, and Ferdinand Schmidt-Kaler1, 2 — 1QUANTUM, Institut für Physik, 55128 Mainz, Germany — 2Helmholtz-Institut Mainz, 55099 Mainz, Germany
Trapped ions are among the leading platforms in quantum computing. We aim to scale up to 50 ions by taking advantage of versatile linear multi-segmented ion traps which combine qubit register reconfigurations [1] and individual addressing of ions in these registers. A fully three-dimensional shaping of electrodes, a homogeneous well-conducting high quality metallic coverage, the precise alignment of trap structures, an excellent optical access, and a fully reliable and repeatable fabrication process are required.
For this we established a special purpose cleanroom. By Selective Laser-induced Etching (SLE) a 3D structure is formed out of fused silica [2]. Metallic sputter deposition results in functional trap chips, which are assembled using a die-bonder, finally fixed on a carrier PCB, and wirebonded for electrical connection of the electrodes.
All fabrication steps can be performed in-house and without leaving the cleanroom in a rapid prototyping fashion (<10 days). We report the testing of devices and the trapping of Ca+ ions.
[1] V. Kaushal et al., AVS Quantum Sci.; 2 (1):014101.
[2] S. Ragg et al., Rev. Sci. Instrum.; 90 (10):103203.
Keywords: Ion Trap; Selective Laser-induced Etching; Sputter Coating; Quantum Computation