Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
K: Fachverband Kurzzeit- und angewandte Laserphysik
K 2: Gas dynamics – Laser Systems and Laser Applications
K 2.4: Vortrag
Montag, 26. Februar 2024, 15:00–15:20, ELP 6: HS 1
High-precision processing of technical glass using a combination of pulsed laser ablation and plasma jet processing at atmospheric pressure — •Martin Ehrhardt1, Robert Heinke1,2, Pierre Lorenz1, Thomas Arnold1,2, and Klaus Klaus Zimmer1 — 1Leibniz Institute of Surface Engineering, Leipzig, Germany — 2Technische Universität Dresden, Germany
One ultra-precision surface processing technique is non-thermal atmospheric reactive plasma jet etching (PJE). PJE uses reactive plasma interaction to remove material from substrate surfaces by converting it to volatile or gaseous substances. Technical glass is made from a variety of materials, including metal oxides. These metal oxides form non-volatile compounds during plasma jet etching that leave a residue layer after processing.Residue layers lead to self-masking and create a barrier that prevents further material removal. It has been shown that this problem can be solved by combining PJE and laser ablation. In the current study, the interaction between PJE-treated technical glass surfaces and pulsed laser radiation is investigated in detail. SEM, EDX and XPS will be used to examine the surfaces after PJE and subsequent laser ablation.