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K: Fachverband Kurzzeit- und angewandte Laserphysik
K 4: Poster
K 4.3: Poster
Montag, 26. Februar 2024, 16:30–18:30, ELP 6: Foyer
Laser-plasma coupling for etching of Zerodur — •Alexander Anthofer1, Martin Ehrhardt1, Pierre Lorenz1, Thomas Arnold1,2, and Klaus Zimmer1 — 1Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany — 2Technische Universität Dresden
The ever-increasing demands for high-performance optics, particularly in the areas of extreme ultraviolet and free-form optics, require continuous advances in manufacturing techniques. One such technique, atmospheric pressure plasma etching, is proving valuable in achieving both high etch rates and tooling precision for materials such as SiO2, SiC and silicon. The plasma generates reactive species that form volatile compounds with the substrate material, resulting in effective material removal. The present study investigates the effects of plasma parameters on the formation of the residual layer on Zerodur and explores the ablatability of these layers with different laser systems. The evaluation includes techniques such as white light interferometry, X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and scanning electron microscopy for a comprehensive analysis of the ablation process.
Keywords: laser; Laser-plasma coupling; Zerodur; free-form optics; plasma