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P: Fachverband Plasmaphysik
P 2: Atmospheric Pressure Plasmas and their Applications I
P 2.1: Hauptvortrag
Montag, 26. Februar 2024, 11:00–11:30, WW 1: HS
Interaction of reactive components of non-equilibrium atmospheric plasmas with liquids and surfaces — •Kerstin Sgonina1, Alexander Quack1, Christian Schulze1, and Jan Benedikt1,2 — 1Institute of Experimental and Applied Physics, Kiel University, Germany — 2KiNSIS, Kiel University
Cold atmospheric pressure plasmas (CAP) are a source of reactive species, such as electrons, ions, radicals, excited species, and photons. Typical application fields are surface or liquid treatments, which are based on additive or synergistic effects of these species at solid surfaces or in liquids. However, knowledge about the isolated effect of each plasma component is rare. The isolated interaction of two different reactive components, positive ions and atomic oxygen, with solid surfaces or liquids, respectively, will be presented.
To study the isolated effect of positive ions on substrates at atmospheric pressure, the so-called Vacuum-ultraviolet(VUV)-photoionization chamber has been developed. It uses a helium driven CAP to generate VUV-radiation to photoionize given precursor. With this, an ion-based thin film deposition at atmospheric pressure can be realized.
For atomic oxygen, its effective reaction with organic compounds in liquids is known. However, it was unknown whether these reactions are liquid-surface or volume dominated. Phenol solutions were used as a chemical probe to be treated by the effluent of the COST-Jet as a source of atomic oxygen. The comparison of experimental and modeling results revealed the predominance of reactions of atomic oxygen at the liquid surface.
Keywords: atmospheric plasma; surface reactions; photoionization; thin film deposition; plasma-liquid interaction