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P: Fachverband Plasmaphysik

P 2: Atmospheric Pressure Plasmas and their Applications I

P 2.3: Vortrag

Montag, 26. Februar 2024, 11:45–12:00, WW 1: HS

Atmospheric plasma as a source of VUV radiation for particle-free thin film deposition — •Tristan Winzer, Christina Reiser, and Jan Benedikt — Institute of Experimental and Applied Physics, Kiel University, Kiel, Germany

Thin-film deposition using plasma to remotely produce VUV photons for photochemistry is an alternative to direct injection of precursor molecules into a plasma, which often results in generation of particles or strong deposition in the source, compromising the properties of the deposited films and the jet operation. This is especially the case at atmospheric pressure, due to high collision rates. At this pressure, noble gas plasmas are efficient sources of VUV radiation down to 60 nm (helium plasma), which can be utilized to initiate photochemistry with subsequent film deposition in precursor gases.

We present here a study on the photochemistry and ionic thin-film deposition from common precursors using a novel source designed for separation of plasma species, radiation and photochemistry products at atmospheric pressure. Precursors were studied for their use in photochemical vapor deposition by analyzing ionic species formed during VUV-treatment of the precursor with ion mass spectrometry and deposited films with Fourier-transform infrared spectroscopy. Particle formation was checked down to 1 nm diameter using a scanning mobility particle sizer.

Keywords: atmospheric-pressure plasma; VUV radiation; mass spectrometry; thin-film deposition; particle generation