Greifswald 2024 – scientific programme
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P: Fachverband Plasmaphysik
P 6: Poster I
P 6.4: Poster
Monday, February 26, 2024, 16:30–18:30, ELP 6: Foyer
Silicon nitride membrane as entrance window for plasma-induced VUV radiation — •Görkem Bilgin1, Luka Hansen1,2, and Jan Benedikt1,2 — 1Institute of Experimental and Applied Physics, Kiel University, Kiel, Germany — 2Kiel Nano, Surface and Interface Science KiNSIS, Kiel University, Kiel, Germany
The measurement of vacuum-ultraviolet (VUV) radiation generated by atmospheric pressure plasmas is restricted by the cutoff-wavelength of typical VUV window materials around 100 nanometers as the VUV radiation has to be transfered into the vacuum to avoid absorption [1]. Silicon nitride membranes originally designed for applications in transmission electron microscopes offer the possibility to be used as entrance windows in monochromators. First measurements show that these membranes are capable of withstanding the forces generated by the pressure gradient while being much thinner (20 nm to 200 nm membrane thickness) than typical VUV window materials.
Two different non-thermal atmospheric pressure plasma sources, based on a capillary jet [2] and a DC microplasma [3], were used to generate He-excimer-radiation in the VUV range.
Results of the vacuum resistance as well as the VUV absorption measurements of the silicon nitride membranes are presented for different membrane thicknesses.
[1] J. Golda et al., 2020 Plasma Process. Polym. 17 201900216
[2] T. Winzer et al., 2022 J. Appl. Phys. 132 183301
[3] L. Hansen et al., 2022 Plasma Sources Sci. Technol. 31 035013
Keywords: VUV; Capillary jet; Microplasma