Bonn 2025 – wissenschaftliches Programm
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Q: Fachverband Quantenoptik und Photonik
Q 51: Quantum Computing and Simulation I (joint session Q/QI)
Q 51.3: Vortrag
Donnerstag, 13. März 2025, 11:30–11:45, AP-HS
Modeling Fabrication Tolerances in RF Junctions for Register-Based Trapped-Ion Quantum Processors — •Florian Ungerechts1, Rodrigo Munoz1, Janina Bätge1, Mohammad Masum Billah1, Axel Hoffmann1,2, Giorgio Zarantonello1,3, and Christian Ospelkaus1,4 — 1Institut für Quantenoptik, Leibniz Universität Hannover, Germany — 2Institut für Hochfrequenztechnik und Funksysteme, Leibniz Universität Hannover, Germany — 3QUDORA Technologies GmbH, Braunschweig, Germany — 4Physikalisch-Technische Bundesanstalt, Braunschweig, Germany
Radiofrequency (RF) junctions are crucial elements for enabling two-dimensional structures in the Quantum Charge-Coupled Device (QCCD) architecture and are thus essential for scaling trapped-ion quantum processors. As the resulting pseudopotential and its attributes depend on the specific junction geometry, they are susceptible to fabrication tolerances. To address this challenge, our study incorporates common microfabrication errors, including feature over- and underexposure and corner rounding, into the simulation models. Utilizing this comprehensive toolset, we evaluate an optimized RF X-junction in a surface-electrode trap, assessing its robustness against typical errors encountered in the multilayer microfabrication process.
Keywords: quantum information processing; trapped ions; QCCD architecture; RF junctions