P 19: Low Pressure Plasmas and their Applications II
Thursday, April 3, 2025, 11:00–12:30, ZHG006
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11:00 |
P 19.1 |
Invited Talk:
A plasma process model for high power impulse magnetron sputtering discharges — •Martin Rudolph, Daniel Lundin, and Jon Tomas Gudmundsson
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11:30 |
P 19.2 |
Investigations of EUV-induced low density hydrogen plasma in a stand-alone high-intensity irradiation setup — •Adelind Elshani, Linus Nagel, Ismael Gisch, Sascha Brose, Hendrik Kersten, Annika Bonhoff, Thorsten Benter, and Carlo Holly
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11:45 |
P 19.3 |
Characterization of a combination sensor for the diagnostic of process plasmas — •Daniel Zuhayra, Caroline Adam, Michael Weise, Thomas Trottenberg, and Holger Kersten
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12:00 |
P 19.4 |
Characterization of a plasma source for atomic tritium — •David Frese for the KAMATE collaboration
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12:15 |
P 19.5 |
Plasma Sheath Tailoring for Advanced 3d Plasma Etching: Effects of Mask Geometry and Etching Materials — •Elia Jüngling, Gerardo Gutiérrez, Marc Böke, and Achim von Keudell
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