Göttingen 2025 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 21: Atmospheric Plasmas and their Applications V
P 21.1: Hauptvortrag
Donnerstag, 3. April 2025, 13:45–14:15, ZHG006
Vacuum UV spectroscopy at atmospheric pressure plasmas utilizing silicon nitride membranes — •Luka Hansen1,2, Görkem Bilgin1, Hendrik Kersten3, and Jan Benedikt1,2 — 1Institute of Experimental and Applied Physics, Kiel University, Kiel, Germany — 2Kiel Nano, Surface and Interface Science KiNSIS, Kiel University, Kiel, Germany — 3Institute for pure and applied mass spectrometry, University of Wuppertal, Wuppertal, Germany
Vacuum ultraviolet (VUV) radiation is crucial for several applications including, e.g., the biomedical field or photocatalysis. A fundamental problem is the transfer from VUV radiation produced in an atmospheric pressure environment into the vacuum for further diagnostics, as typical window materials like LiF or MgF2 are not suited for this transfer due to their cut off wavelength at 115 nm. Different approaches have been pursuit in the past to overcome this problem involving, e.g., differential pumping [1] or an aerodynamic window [2].
A new approach is utilizing a ultra-thin Si3N4 membrane with a thickness of 20 nm as entrance window. These membranes can withstand the pressure gradient of one atmosphere and showed resistance against plasma and plasma-generated species [3].
This approach allows to resolve spectra down to 58.4 nm (He resonance line) and reveal interesting self-absorption effects of noble gases influencing previously reported VUV spectroscopy measurements.
[1] F. Liu et al., 2020 Plasma Sources Sci. Technol. 29 065001
[2] J. Golda et al., 2020 Plasma Process. Polym. 17 201900216
[3] L. Hansen et al., 2023 Thin Solid Films 765 139633
Keywords: Vacuum ultraviolet; Spectroscopy; atmospheric pressure plasma; Silicon nitride membrane