Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
CPP: Fachverband Chemische Physik und Polymerphysik
CPP 15: Poster Session I
CPP 15.26: Poster
Montag, 17. März 2025, 19:00–21:00, P4
Kinetics of nanostructure and interface evolution induced by photopolymerization — •Shouzheng Chen1,2,3, Yufeng Zhai2, Jungui Zhou2, Guangjiu Pan1, Sarathlal Koyiloth Vayalil2, Rolf A.T.M. van Benthem4, Johan F.G.A Janssen5, Mats K. G. Johansson6, Peter Müller-Buschbaum1, and Stephan V. Roth2,6 — 1TUM School of Natural Sciences, Chair for Functional Materials, 85748 Garching, Germany — 2DESY, Notkestraße 85, 22607 Hamburg, Germany — 3FRM II, Lichtenbergstraße 1, 85748 Garching, Germany — 4Eindhoven University of Technology, Groene Loper 5, 5600, MB, Eindhoven, the Netherlands — 5Covestro (Netherlands) B.V., Urmonderbaan 22, 6167, RD, Geleen, the Netherlands — 6Department of Fibre and Polymer Technology, KTH Royal Institute of Technology, Teknikringen 56, SE-100 44 Stockholm, Sweden
Photopolymerization offers spatial resolution, low energy consumption, and high curing speeds, making it a widely used technology in additive manufacturing. The kinetics of the physical transformation of the resin from liquid to solid (cross-linked) state induced by photopolymerization and the kinetics of the solid-liquid interface formation of resin multilayer are the key to achieving controllable high-precision manufacturing. By modulating precursor resin components and combining grazing incidence small angle X-ray scattering (GISAXS), the UV-curing induced nanostructure and the buried interface of resin multilayer are probed. We reveal how solvents and additive monomers determine in nanostructure and multilayer interface formation during photopolymerization.
Keywords: Photopolymerization; GISAXS