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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 32: Poster Session II

CPP 32.11: Poster

Donnerstag, 20. März 2025, 09:30–12:00, P3

Extension of initiated chemical vapor deposition to new polymers via silylation — •Lynn Schwäke¹, Artjom Businski², Thomas Strunskus¹, Franz Faupel¹, Rainer Herges², and Stefan Schröder¹ — ¹Chair for Multicomponent Materials, Department of Materials Science, Kiel University, 24143 Kiel, Germany — ²Otto Diels Institute of Organic Chemistry, Kiel University, 24143 Kiel, Germany

Initiated Chemical Vapor Deposition (iCVD) is a powerful technique for the solvent-free and conformal deposition of polymer thin films on sensitive substrates and complex geometries. The utilisation of a variety of monomers enables the fabrication of films with specifically tailored properties and functionalities. However, the evaporation of monomers is a prerequisite for iCVD processes. Consequently, this limits its applicability, for example, in the synthesis of hydrogels. The hydrophilic nature of potential monomers and the presence of other strong intermolecular interactions result in low vapor pressures, which in turn hinders their use in iCVD. A well-known strategy, e.g. in the context of drug detection by gas chromatography-mass spectrometry (GC-MS), is silylation, which is used to weaken inter-molecular forces. Here silylation was employed to enhance the vapor pressure of hydrophilic 2-hydroxyethyl methacrylate (HEMA), an important monomer in the synthesis of hydrogels. Consequently, silylation is proposed as a general route for the introduction of low vapor pressure monomers into iCVD systems, which would lead to a significant expansion of the available monomer toolbox.

Keywords: Chemical vapor deposition; Polymers; Hydrogel; iCVD