Regensburg 2025 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 1: Thin Film Properties

DS 1.6: Vortrag

Montag, 17. März 2025, 11:00–11:15, H3

Morphological characterization of Sub-10 nm surface patterns created by block-copolymer self-assembly — •Harikrishnan Venugopal, Janna X. Friebel, Julius Bürger, and Jörg K.N. Lindner — Universität Paderborn, Department Physik, Warburgerstraße 100

The microphase separation in block copolymers (BCPs) is a self-assembly process allowing to create ordered patterns on large substrate surfaces in short times and at low costs. Numerous applications of such patterns have been identified in the area of micro- and optoelectronics, data storage, catalysis, nanoporous membranes, and biomedical materials. If BCP self-assembly is used to create lithographic masks by removing one of the polymers selectively, for any targeted application it is important to characterise the morphology of polymer domains precisely at each processing step. In this work, we report on the morphology of silicon oxide nano structures fabricated by BCP self-assembly on Si substrates. A polystyrene-polydimethylsiloxane block copolymer (PS-b-PDMS) with a molar mass of 15 kg/mol and a PS volume fraction of 68.75 % was dissolved and spin coated onto silicon substrate. Microphase separation was initiated by solvent vapor annealing and results in the formation of fingerprint like surface patterns. A high-power oxygen plasma treatment is done to selectively remove the PS domains while converting the PDMS to silicon oxide. TEM, SEM and AFM analyses were performed to understand why after the plasma treatment half-cylinder patterns are observed.

Keywords: Block copolymers; Self assembly