Regensburg 2025 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
DS: Fachverband Dünne Schichten
DS 13: Poster
DS 13.28: Poster
Thursday, March 20, 2025, 18:00–20:00, P1
Deposition of Cr self-intercalated Cr1+δTe2 thin films by Hybrid Pulsed Laser Deposition — •Pia Henning, Laura Pflügl, Anna Tschesche, Tobias Meyer, and Jasnamol Palakkal — Institute of Material Physics, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
Cr1+δTe2 thin films exhibited an increased interest over the last few years, due to their tunable magnetic anisotropy and ferromagnetism with TC ranging from 150 K to 350 K [1]. This tunability of magnetic properties is sensitively linked to the stoichiometry, governed by the self-intercalation of Cr species between CrTe2 layers [1]. Therefore, the sensitive control of δ in addition with the insurance of high crystalline quality, with epitaxial and low defect growth, is crucial for a profound discussion and comparison of thin film properties. In this work, we used a hybrid pulsed laser deposition (PLD) unit attached with Te molecular beam source for growing high quality Cr1+δTe2 thin films [1]. We studied the influences of different growth parameter settings on the thin film quality and properties. We were able to carefully modify the δ and thickness of the films and investigated their correlation with the magnetic and electronic properties. This material system is a promising candidate for spintronics application due to room temperature ferromagnetism, anisotropic magnetoresistance and huge perpendicular magnetic anisotropy. Our findings manifest the advantages of this technique for depositing further novel transition metal chalcogenides. [1] A. Tschesche, P. Henning, et al., Preprint on Research Square, https://doi.org/10.21203/rs.3.rs-4861088/v1
Keywords: Transition Metal Chalcogenides; Pulsed Laser Deposition; Molecular Beam Epitaxy; Thin Film Deposition