DS 2: Layer Deposition
Montag, 17. März 2025, 09:30–10:45, H14
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09:30 |
DS 2.1 |
Bidirectional Growth of Functional Oxides by Molecular Beam Epitaxy — •Nicolas Bonmassar, Georg Christiani, and Gennady Logvenov
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09:45 |
DS 2.2 |
Enabling vacuum process monitoring with time-of-flight spectroscopy — •Marco John, Kristian Kirsch, Andreas Trützschler, Christoph Bartlitz, Marcel Herrmann, and Klaus Bergner
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10:00 |
DS 2.3 |
Selective Area Atomic Layer Deposition via Photoexcitation — •Paul Butler, Stefan A. Maier, and Ian D. Sharp
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10:15 |
DS 2.4 |
Enabling FAIR Data Practices in MBE Growth and Characterization — •Andrea Albino, Hampus Näsström, Sarthak Kapoor, Altuğ Yildirim, Oliver Bierwagen, Martin Albrecht, and Sebastian Brückner
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10:30 |
DS 2.5 |
Role of point defects on the superconducting transition temperature in NbTIN thin films with positron annihilation spectroscopy — •Sebastian Klug, Maik Butterling, Maciej Oskar Liedke, Eric Hirschmann, Andreas Wagner, Bharath Reddy Lakki Reddy Venkata, Aleksandr Zubtsovskii, and Xin Jiang
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