DS 5: Thin Oxides and Oxide Layers
Dienstag, 18. März 2025, 14:00–15:15, H3
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14:00 |
DS 5.1 |
How to functionalize 2D states at oxide interfaces by controlled redox reaction — •Pia Maria Düring, Andreas Fuhrberg, Timo Krieg, Verena Reva, and Martina Müller
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14:15 |
DS 5.2 |
Adsorption-controlled growth of α-(Al,Ga)2O3 and β-(Al,Ga)2O3 on Al2O3 by suboxide molecular-beam epitaxy (S-MBE) — •Sushma Raghuvansy, Marco Schowalter, Alexander Karg, Manuel Alonso-Orts, Martin Williams, Stephan Figge, Andreas Rosenauer, Martin Eickhoff, and Patrick Vogt
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14:30 |
DS 5.3 |
Tuning the interlayer coupling in La0.7Sr0.3MnO3 / LaNiO3 multilayers with strong perpendicular-magnetic-anisotropy — •Jörg Schöpf, Valentina Piva, Paul H. M. van Loosdrecht, Padraic Shafer, Divine P. Kumah, Xuanyi Zhang, Lide Yao, Sebastiaan van Dijken, and Ionela Lindfors-Vrejoiu
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14:45 |
DS 5.4 |
Multinary compositionally graded, spatially addressable materials libraries by pulsed laser deposition — •Jorrit Marius Bredow, Marius Grundmann, and Holger von Wenckstern
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15:00 |
DS 5.5 |
Tri-functionality in a Single Oxide Interface-Based Nanostructure with Reconfigurable Logic-in-Memory Applications — •Soumen Pradhan, Kirill Miller, Fabian Hartmann, Merit Spring, Silke Kuhn, Victor Lopez-Richard, Michael Sing, Ralph Claessen, and Sven Höfling
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