Regensburg 2025 – scientific programme
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DS: Fachverband Dünne Schichten
DS 9: Optical Analysis of Thin Films II
DS 9.2: Invited Talk
Thursday, March 20, 2025, 10:00–10:30, H3
Metrological spectroscopic and imaging Mueller matrix ellipsometry for the analysis of thin films and nanostructured surfaces — •Bernd Bodermann1, Matthias Wurm1, Manuela Schiek2, Jana Grundmann1, and Tim Käseberg1 — 1Optical Nanometrology, PTB, Bundesallee 100, 38116 Braunschweig — 2Center for Surface and Nano-Analytics (ZONA) Johannes Kepler University Linz, Austria
Spectroscopic Mueller ellipsometry is a widely used method for analysing thin films and nanostructured surfaces. The extension to imaging ellipsometry enables measurements on small measurement objects << 1 mm2 and investigations of local parameter variations. However, as an integral and indirect measurement method, the determination of the corresponding measurement uncertainties is challenging and requires complex analysis methods. Imaging ellipsometry, involves an even higher level of complexity both in terms of data analysis and the necessary metrological system characterisation. We give an overview of various experimental sources of uncertainty including structure-induced contributions and how these can be characterised. Both deterministic and stochastic contributions of the measurement system as well as the samples under test will be discussed. Additionally, we present investigations of sensitivity-enhanced ellipsometry, by e.g. exploiting local plasmonic or dielectric resonances in the sample structure, and advanced methods that use additional structures to amplify and/or guide resonances for the detection and characterisation of periodic and non-periodic structures.
Keywords: Ellipsometry; Mueller matrix; metrology; nanostructures; plasmonic resonances