Regensburg 2025 – scientific programme

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HL: Fachverband Halbleiterphysik

HL 40: 2D Semiconductors and van der Waals Heterostructures IV

HL 40.13: Talk

Wednesday, March 19, 2025, 18:45–19:00, H15

Expanding the lithography toolbox - 2D devices and beyond — •Vasilis Theofylaktopoulos — Heidelberg Instruments Nano AG, Bändliweg 30, 8048 Zurich, Switzerland

Lithography is used in 2D devices to contact them with precisely placed electrodes, shape the building blocks or to control other properties such as doping or strain. Thermal scanning probe lithography is an up and coming method that can assist in all of the above.[1] In this talk the working principle of tSPL will be introduced and examples of its application will be given in the field of 2D electronics, photonics and metasurfaces.[2,3,4]

The NanoFrazor is a tSPL tool offering complimentary features to established lithography techniques such as photolithography, ebeam and focused ion beam. It uses a heated cantilever to write features with sizes bellow 15nm. At the same time grayscale patterning is possible with a resolution of 2nm. A reader is integrated at the tip allowing for parallel imaging to the patterning enabling markerless overlay. This simplifies the placement of features on 2D materials which are easily imaged under the resist. A laser can be used with the same resist stacks to create larger features >500nm such as contact pads. Finally, the process patterning the resist through sublimating it can yield devices with better electronics properties compared to ebeam.[5]

[1] S. T. Howell, A. Grushina, F. Holzner, and J. Brugger, Thermal scanning probe lithography - a review, Microsyst. Nanoeng., vol. 6, no. 1, p. 21, Apr. 2020, doi: 10.1038/s41378-019-0124-8.

[2] X. Liu et al., Thermomechanical Nanostraining of Two-Dimensional Materials, Nano Lett., vol. 20, no. 11, pp. 8250-8257, Nov. 2020, doi: 10.1021/acs.nanolett.0c03358.

[3] M. C. Giordano, G. Zambito, M. Gardella, and F. Buatier De Mongeot, Deterministic Thermal Sculpting of Large Scale 2D Semiconductor Nanocircuits, Adv. Mater. Interfaces, vol. 10, no. 5, p. 2201408, Feb. 2023, doi: 10.1002/admi.202201408.

[4] N. Marcucci, M. C. Giordano, G. Zambito, A. Troia, F. Buatier De Mongeot, and E. Descrovi, Spectral tuning of Bloch Surface Wave resonances by light-controlled optical anisotropy, Nanophotonics, vol. 12, no. 6, pp. 1091-1104, Mar. 2023, doi: 10.1515/nanoph-2022-0609.

[5] A. Conde-Rubio, X. Liu, G. Boero, and J. Brugger, Edge-Contact MoS2 Transistors Fabricated Using Thermal Scanning Probe Lithography, ACS Appl. Mater. Interfaces, vol. 14, no. 37, pp. 42328-42336, Sep. 2022, doi: 10.1021/acsami.2c10150.

Keywords: nanolithography