Regensburg 2025 – wissenschaftliches Programm

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MA: Fachverband Magnetismus

MA 15: Poster I

MA 15.36: Poster

Dienstag, 18. März 2025, 10:00–12:30, P1

Preparation and characterization of Co₂₀Fe₈₀Si_x thin films — •Florian Knossalla, Maik Gaerner, Luca Kempe, Karsten Rott, Jan Schmalhorst, and Günter Reiss — Bielefeld University, Germany

In spintronics, materials with favorable magnetic properties, such as large magnetic polarization and a high Curie temperature are essential. By means of machine learning, different Fe-Co-Si compounds were identified as promising [1]. This study focuses on the investigation of alloys with the composition Co₂₀Fe₈₀Si_x.

The samples were fabricated using DC and RF magnetron co-sputtering. Subsequently, temperature-dependent resistance measurements, investigations of the ordinary and the anomalous Hall effect were performed alongside with measurements of the anisotropic magneto-resistance.
The magnetic polarization decreased with increasing silicon content, from approximately 2 T for Co₂₀Fe₈₀ to about 0.5 T for Co₂₀Fe₈₀Si₁₀₀. In the latter, a phase transition at 60K was observed, which coincides with the appearance of a linear nonsaturating magnetoresistance. Interestingly, Co₂₀Fe₈₀Si₅₀ exhibited a higher magnetic polarization than Co₂₀Fe₈₀Si₂₅, as well as twice the charge carrier density compared to Co₂₀Fe₈₀.
[1]Timothy Liao u. a. Phys. Rev. Materials 7, 034410(2023)

Keywords: Sputtering; Spintronics; AHE; AMR