Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

MA: Fachverband Magnetismus

MA 15: Poster I

MA 15.37: Poster

Dienstag, 18. März 2025, 10:00–12:30, P1

Real-time in-situ giant magnetoresistance measurements in Co/Cu multilayers during sputter deposition — Michael Mattern, •Luca Kempe, Jan Schmalhorst, and Günter Reiss — Bielefeld University, Faculty of Physics, Germany

Magnetoresistive sensors generate important input information that is further processed in complex microelectronic systems in a wide range of applications. For optimization purposes or the investigation of new material combinations, a permanent analysis of the influence of deposition conditions on the magnetoresistive performance is necessary. Today, research and development in the field of magnetic sensor technology is slowed down due to slow feedback from results of ex-situ characterization of samples into modelling and production. This study presents an experimental technique for real-time in-situ measurements of magnetoresistive effects, such as giant magnetoresistance (GMR), during the sputtering process. As an example, an oscillating in-plane magnetic field with an amplitude of 420 Oe and a frequency of 10 Hz was applied to samples of cobalt/copper multilayers during film growth. By employing advanced instrumentation with a sampling rate of 20 kS/s and the implementation of real-time GMR amplitude calculation, we were able to obtain and analyze complete R versus H curves within 100 milliseconds. Correlations between the magnetic response of these samples and structural changes at different stages of film deposition are shown.

Keywords: magnetoresistance; sputtering; in-situ; GMR