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MM: Fachverband Metall- und Materialphysik
MM 21: Interface Controlled Properties, Nanomaterials and Microstructure Design
MM 21.9: Vortrag
Mittwoch, 19. März 2025, 17:45–18:00, H22
Direct Laser Writing of metallic material utilizing the principle of sensitized triplet-triplet upconversion — •Kristin E. J. Kühl1 and Georg von Freymann1,2 — 1University of Kaiserslautern-Landau, 67663 Kaiserslautern — 2Fraunhofer Institute for Industrial Mathematics ITWM, 67663 Kaiserslautern
Direct Laser Writing (DLW) is a versatile technique for fabrication of microstructures, which is constantly evolving. Conventional DLW uses two photon absorption to form polymers from monomers via a photochemical reaction. Current research is leaning towards new materials, such as different kinds of metal which satisfy different demands on the physical properties of structures like electric conductivity or ferromagnetism, as well as the application of different photochemical reactions to provide more opportunities in the implementation of the printing process.
In this talk a novel approach to Direct Laser Writing of metallic materials is presented. For this purpose, photochemical compounds and principles were investigated via different methods and applied in a home built setup for Direct Laser Writing. A sensitized triplet-triplet annihilation upconversion process (sTTA-UC) is used to generate the energy required for the photochemical reduction of nickel. Since efficient sTTA-UC is usually limited to deoxygenated materials, a solvent is used that has the property of generating a local deoxygenated area upon excitation by a sensitizer. These three processes are combined to enable Direct Laser Writing of 2D nickel structures.
Keywords: Direct Laser Writing; photochemical reduction; sensitized triplet triplet upconversion; additive manufacturing of metal