Regensburg 2025 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 58: Solid-Liquid Interfaces: Reactions and Electrochemistry II

O 58.2: Vortrag

Mittwoch, 19. März 2025, 10:45–11:00, H4

ALD coatings on 1D and 3D structures for electrochemical applications — •Siow Woon Ng — Department of Chemistry and Pharmacy, Friedrich-Alexander-Universität Erlangen Nürnberg, Egerlandstraße 3, 91058 Erlangen, Germany

Atomic layer deposition (ALD) utilizes self-limiting surface reactions to construct ultrathin films layer by layer. Among many deposition techniques, ALD uniquely offers conformal deposition and excellent coating thickness control. Hence, the technique is particularly attractive for depositing structures with complex geometries, such as spheres, foams, 1D nanostructures, and 3D structures. This presentation discusses the preparation of 1D nanostructure and 3D-printed structures, followed by ALD inorganic and semiconductor coatings on these scaffolds. The influence of surface properties on the ALD coatings, and how the coatings enhance the electrical, mechanical, optical, and chemical properties or introduce new functionalities to the host structures will be presented. In particular, we will demonstrate that thin coatings in nanometer thicknesses are optimized for sensing and photo- and electrocatalytic applications.

Keywords: photoelectrochemistry; atomic layer deposition; 1D nanostructures; 3D printing